Preparation methods: electrolytic deposition, cathodic and anodic films,
thermal evaporation, cathodic sputtering, chemical vapour deposition.
Molecular beam epitaxy and laser ablation methods.
Thickness measurement and monitoring: electrical, mechanical, optical
interference, microbalane, quartz crystal methods.
Analytical techniques of characterization: X-ray diffraction, electron
microscopy, high and low energy electron diffraction, Auger emission
spectroscopy.
Growth and structure of films. General features. Nucleation theories
Effect of electron bombardment on film structure. Post - nucleation
growth Epitaxial films and growth. Structural defects.
Mechanical properties of films: elastic and plastic behaviour. Optical
properties. Reflectance and transmittance spectra. Absorbing films.
Optical constants of film material. Multilayer films. Anisotropic and
isotropic films.
Electric properties to films: Conductivity in metal, semiconductor and
insulating films. Discontinuous films. Superconducting films.
- Teacher: SUBRAHMANYAM A (PH)